Directed self-assembly with sub-100 degrees Celsius processing temperature, sub-10 nanometer resolution, and sub-1 minute assembly time.

and thus alternative technologies such as extreme ultraviolet (EUV) lithography, nanoimprint lithography, interference lithography, and directed self-assembly (DSA) are emerging rapidly. [ 2 , 3 , 8–16 ] DSA of block copolymers (BCPs) has recently attracted much attention as a promising candidate for nextgeneration lithography due to its capacity to provide excellent resolution and scalability. [ 3 , 17–25 ] The self-assembly of a BCP, where two mutually incompatible polymer chains are connected via covalent bonding, can create sub-20 nm periodic patterns with different geometries such as dots, lines, holes, and rings, [ 17 , 18 , 26–28 ] while even more complex features such as bends, T-junctions, and jogs have already been demonstrated. [ 29 ]